The Mil-PRF-38535 Standard (Page 2 of 2)

   

 

    

Table 1. Examples of Changes that Require TRB Approval per Mil-PRF-38535

Area

Changes Subject to TRB Evaluation

Design

- technology database

- design flow

- design system

- software updates

- model or modeling procedures

- configuration management

- radiation hardness assurance (if applicable)

- electrical performance

Wafer Fab

- fabrication process sequence or process limits

- fabrication process materials or material specs

- photoresist materials or material specs

- doping material source, concentration, or process technique

- cross-section diffusion profile

- passivation or glassivation material, thickness, or technique

- metallization system (pattern, material, deposition/etch technique, line width/thickness)

- bond pad geometry, spacing or metallization

- baseline

- conductor, resistor, or dielectric materials

- wafer fab move from one line or building to another

- passivation or glassivation process- oxidation or diffusion process, oxide composition and thickness, oxidation temperature and time

- sintering or annealing temperature and time

- SEC and how it is tested

- method of mask making

- parametric monitor and method of test

- wafer acceptance criteria

- TCV and how it is tested

- sampling plans

- gate formation process, material, technique

- backside process including wafer thinning and backside metallization

- ohmic contact formation

- starting material qualification

- lot formation

Assembly

- die attach material, method, or location

- wire/ribbon bond interconnection method

- wire material, composition, and dimensions

- seal technique (materials, process, etc.)

- internal visual inspection and other test procedures

- assembly flow

- assembly operation move

- scribing and die separation method

- TCI procedures including manufacturer imposed tests

- screening tests

- sampling plans

- die back surface preparation

- molding material, method, or location

- chip coating material and technique

- device marking process

- lot formation

Package

- vendor

- external dimensions

- cavity dimensions

- number of leads or terminals

- lead or terminal dimensions

- lead or terminal base material

- lead or terminal plating material

- lead or terminal plating thickness

- package body material

- package body plating material

- package body plating thickness

- die pad material

- die pad plating

- die pad plating thickness

- lid material

- lid plating material

- lid plating thickness

- lid seal (preform) material

- lid glass seal material

- lead glass seal material

- lead glass seal diameter

- leads or terminal spacing

- lead configuration (e.g., J-lead, gullwing, etc.)

- die size

- device marking

- lead attachment

Test

- internal visual inspection and other test procedures

- testing flow

- test facility

- sampling plans

- test procedures

- lot formation

           

<Page 1 - Intro to QML and TRB>     <Page 3 - QML Certification>

       

   

 

   

See Also:  Mil-Std-883 MethodsMil QCI Group TestsMil Lot Screen Tests

      

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